Effects of annealing treatment on optical properties of anatase TiO 2 thin films

World Academy of Science, Engineering and Technology

Volumn 40, Issue , 2009, Pages 221-225

  Hasan, M M ^a   Haseeb, A S M A ^a   Saidur, R ^a   Masjuki, H H ^a  

^a UNIVERSITY OF MALAYA   (Malaysia)

Author keywords

Optical properties; RF reactive sputtering; Structural properties; Surface morphology; Titanium dioxide

Indexed keywords

AFM IMAGE; ANATASE FILMS; ANATASE PHASE; ANATASE TIO; ANNEALED FILMS; ANNEALING TEMPERATURES; ANNEALING TREATMENTS; AS-DEPOSITED FILMS; CROSS SECTIONAL IMAGE; CRYSTALLINE PHASE; DIRECT BAND GAP; EXTINCTION COEFFICIENTS; GLASS SUBSTRATES; OPTICAL THICKNESS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF REACTIVE SPUTTERING; ROOM TEMPERATURE; SEM; SMALL VARIATIONS; SPUTTERING PRESSURES; STRUCTURE AND MORPHOLOGY; TAUC MODEL; TIO; TRANSMISSION SPECTRUMS; VISIBLE RANGE; VISIBLE TRANSMITTANCE;

ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; DIFFRACTION; ENERGY GAP; HOLOGRAPHIC INTERFEROMETRY; LIGHT TRANSMISSION; MORPHOLOGY; OPTICAL BAND GAPS; OPTICAL CONSTANTS; ORGANIC POLYMERS; REFRACTIVE INDEX; SURFACE MORPHOLOGY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY DIFFRACTION;

OPTICAL FILMS;

EID: 78651563516     PISSN: 2010376X     EISSN: 20103778     Source Type: Journal    
DOI: None     Document Type: Article

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