Effect of annealing temperatures on the micro-structure of CuInS 2 thin film by one-step electrodeposition

Advanced Materials Research

Volumn 150-151, Issue , 2011, Pages 530-533

  Lu, Lin ^a   Wang, Yanjie ^a   Li, Xiaogang ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

Annealing temperature; CuInS2 film; One step electrodeposition

Indexed keywords

ANNEALING TEMPERATURES; CHALCOPYRITE STRUCTURES; CRYSTALLINITIES; CUINS2 FILM; ONE-STEP ELECTRODEPOSITIONS; PHOTOVOLTAIC APPLICATIONS; SEM; UV-VIS-NIR SPECTROSCOPY;

ANNEALING; COPPER COMPOUNDS; ELECTRODEPOSITION; FILM GROWTH; GRAIN GROWTH; NEAR INFRARED SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

FILM PREPARATION;

EID: 78650645178     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMR.150-151.530     Document Type: Conference Paper

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