SCOPUS 정보 검색 플랫폼

Optical Materials

Volumn 33, Issue 3, 2011, Pages 424-427

Annealing behavior of single mode planar waveguide in YVO4 produced by He ion implantation

(5) Liu, Xiu Hong a Wang, Ke Ming a Zhao, Jin Hua a Zhang, Shao Mei a Chen, Ming a

a SHANDONG UNIVERSITY (China)

Author keywords

Annealing; Implantation; Single mode planar waveguide

Indexed keywords

HELIUM; ION IMPLANTATION; IONS; LIQUID NITROGEN; OPTICAL WAVEGUIDES; PLANAR WAVEGUIDES; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUPERCONDUCTING MATERIALS;

ANNEALING TREATMENTS; EFFECTIVE REFRACTIVE INDEX; HE ION IMPLANTATION; LIQUID NITROGEN TEMPERATURE; PRISM COUPLING METHOD; REFRACTIVE INDEX PROFILES; RUTHERFORD BACKSCATTERING CHANNELING; SINGLE MODE;

ANNEALING;

EID: 78650527326 PISSN: 09253467 EISSN: None Source Type: Journal
DOI: 10.1016/j.optmat.2010.10.015 Document Type: Article

Times cited : (6)

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