Ion implantation of optical ferroelectrics

Journal of Electroceramics

Volumn 3, Issue 2, 1999, Pages 179-193

  Buchal, Ch ^a   Fluck, D ^b   Gunter P ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; CRYSTAL DEFECTS; DOPING (ADDITIVES); FERROELECTRIC MATERIALS; FILM GROWTH; METALLORGANIC VAPOR PHASE EPITAXY; OPTICAL PROPERTIES; OPTICAL WAVEGUIDES; THIN FILMS;

IMPLANTED INDUCED VACANCY; LASER EPITAXY; LATTICE DEFECTS; OPTICAL FERROELECTRICS; PHOTOREFRACTIVE PROPERTIES;

ION IMPLANTATION;

EID: 0032656971     PISSN: 13853449     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1009951311965     Document Type: Article

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