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Volumn 447 448, Issue , 2010, Pages 740-744

Room temperature processed hard easy clean coating using ammonia treatment

Author keywords

Ammonia treatment; Hardness; Hydrophobic; Sol gel

Indexed keywords

AMMONIA; CONTACT ANGLE; CURING; HARDNESS; HYDROPHOBICITY; PRECISION ENGINEERING; SOL-GEL PROCESS; SUBSTRATES; SURFACE ROUGHNESS; SURFACE TREATMENT; TEMPERATURE; THICKNESS MEASUREMENT;

EID: 78650468384     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/KEM.447-448.740     Document Type: Conference Paper
Times cited : (4)

References (6)
  • 1
    • 85051586059 scopus 로고
    • Ammonia hardening of porous silica antireflective coating
    • 13, October
    • F. B. Philippe, G. F. Herve, Ammonia hardening of porous silica antireflective coating, SPIE Sol-gel Optics III, Proceeding Vol. 2288, 13, October 1994, 25-32
    • (1994) SPIE Sol-gel Optics III, Proceeding , vol.2288 , pp. 25-32
    • Philippe, F.B.1    Herve, G.F.2
  • 3
    • 0034299706 scopus 로고    scopus 로고
    • Properties of sol-gel derived scratch-resistant nanoporous silica films by a mixed atmosphere treatment
    • G. Wu, J. Wang, J. Shen, T. Yang et al, Properties of sol-gel derived scratch-resistant nanoporous silica films by a mixed atmosphere treatment, J. Non-cryst. Solids, 275 (2000) 169-174
    • (2000) J. Non-cryst. Solids , vol.275 , pp. 169-174
    • Wu, G.1    Wang, J.2    Shen, J.3    Yang, T.4
  • 4
    • 0035820814 scopus 로고    scopus 로고
    • Strengthening mechanism of porous silica films derived by two-step catalysis
    • G. Wu, J. Wang, J. Shen, Strengthening mechanism of porous silica films derived by two-step catalysis, J. Phys. D: Appl. Physics, 34 (2001) 301-307
    • (2001) J. Phys. D: Appl. Physics , vol.34 , pp. 301-307
    • Wu, G.1    Wang, J.2    Shen, J.3
  • 5
    • 78650429046 scopus 로고    scopus 로고
    • Silica and silica-like films and method of production
    • US Patent No. 7642199B2, Jan. 5, 2010
    • P. Meredith, and M. Harvey, Silica and silica-like films and method of production, US Patent No. 7642199B2, Jan. 5, 2010
    • Meredith, P.1    Harvey, M.2
  • 6
    • 78650434401 scopus 로고    scopus 로고
    • Control of Morphology of silica films
    • US patent application, No. US 2008/0292889A1, Nov. 27, 2008
    • M. Harvey, and P. Meredith, Control of Morphology of silica films, US patent application, No. US 2008/0292889A1, Nov. 27, 2008
    • Harvey, M.1    Meredith, P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.