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Volumn 1245, Issue , 2010, Pages 433-438
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Biaxial texturing of inorganic photovoltaic thin films using low energy ion beam irradiation during growth
a,b a a b c a a |
Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
BUFFER LAYERS;
CALCIUM FLUORIDE;
FLUORSPAR;
GRAIN BOUNDARIES;
ION BEAM ASSISTED DEPOSITION;
ION BEAMS;
ION BOMBARDMENT;
POLYCRYSTALLINE MATERIALS;
SILICON WAFERS;
SINGLE CRYSTALS;
SUPERCONDUCTING FILMS;
TEXTURES;
BIAXIALLY TEXTURED TEMPLATE;
CANDIDATE MATERIALS;
EPITAXIAL DEPOSITION;
LOW ENERGY ION BEAM;
PHOTOVOLTAIC DEVICES;
PHOTOVOLTAIC THIN FILMS;
POLYCRYSTALLINE THIN FILM;
SINGLE CRYSTAL SUBSTRATES;
THIN FILMS;
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EID: 78650386296
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-1245-a20-06 Document Type: Conference Paper |
Times cited : (2)
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References (11)
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