Determination of trace Tl(I) by anodic stripping voltammetry on novel disposable microfabricated bismuth-film sensors

Electroanalysis

Volumn 22, Issue 20, 2010, Pages 2359-2365

  Kokkinos, Christos ^a   Raptis, Ioannis ^b   Economou, Anastasios ^a   Speliotis, Thanassis ^c  

^a UNIVERSITY OF ATHENS   (Greece)

^b INSTITUTE OF MICROELECTRONICS   (Greece)

^c INSTITUTE OF MATERIALS SCIENCE   (Greece)

Author keywords

Anodic stripping voltammetry; Bismuth film electrodes; Microfabrication; Thallium

Indexed keywords

BISMUTH; CADMIUM COMPOUNDS; ELECTRODES; LEAD COMPOUNDS; MECHANICAL STABILITY; MICROANALYSIS; MICROFABRICATION; SILICON OXIDES; SILICON WAFERS; STRIPPING VOLTAMMETRY; THALLIUM COMPOUNDS; TRACE ANALYSIS; TRACE ELEMENTS;

ANODIC STRIPPING VOLTAMMETRY; BISMUTH FILM; BISMUTH-FILM ELECTRODE; DISPOSABLES; MICRO-FABRICATION; MICROFABRICATED; MULTISTEPS; PRECONCENTRATION TIME; SQUARE WAVE ANODIC STRIPPING VOLTAMMETRY; TRACE DETERMINATION;

SILICA;

EID: 78650300190     PISSN: 10400397     EISSN: 15214109     Source Type: Journal    
DOI: 10.1002/elan.201000252     Document Type: Article

References (25)

1. S. Galvań-Arzate, A. Santamariá, Toxicol. Lett. 1998, 99, 1.
2. J. Wang, Stripping Analysis, Deerfield Beach, VCH, FL 1985.
3. J. Wang, J. Lu, S. B. Hocevar, P. A. M. Farias, B. Ogorevc, Anal. Chem. 2000, 72, 3218.
4. J. Wang, Electroanalysis 2005,17, 1341.
5. A. Economou, Trends Anal. Chem. 2005, 24, 334.
6. C. Kokkinos, A. Economou, Curr. Anal. Chem. 2008, 4, 183.
7. J. Wang, J. Lua, Ü. A. Kirgoz̈, S. B. Hocevar, B. Ogorevc, Anal. Chim. Acta 2001, 434, 29.
8. I. Švancara, L. Baldrianová, E. Tesařova, S. B. Hočevar, S. A. A. Elsuccary, A. Economou, S. Sotiropoulos, B. Ogorevc, K. Vytřas, Electroanalysis 2006,18, 177.
9. C. Prior, G. S. Walker, Electroanalysis 2006,18, 823.
10. I. Švancara. M. Fairouz, K. Ismail, J. Šrmáková, R. Metelka, K. Vyťas, Sci. Pap. Univ. Pardubice, Ser. A, 2004,10, 5.
11. G. J. Lee, H. M. Lee, Y. R. Uhm, M. K. Lee, C. K. Rhee, Electrochem. Commun. 2008,10, 1920.
12. B Krasnodȩbska-Ostrȩga, J. Paldyna, J. Golimowski, M. Kania, Chem. Anal. (Warsaw) 2009, 54, 109.
13. M. Korolczuk, W. Surmacz, K. Tyszczuk, Electroanalysis 2007,19, 2217.
14. E. O. Jorge, M. M. M. Neto, M. M. Rocha, Talanta 2007, 72, 1392.
15. V. A. Tarasova, J. Anal. Chem. 2007, 62, 157.
16. Z. Zou, A. Jang, E. Mac Knight, P.M. Wu, J. Do, P.L. Bishop, C. H. Ahn, Sens. Actuators B, Chem. 2008, 134, 18.
17. C. Kokkinos, A. Economou, I. Raptis, C. E. Efstathiou, T. Speliotis, Electrochem. Commun. 2007, 9, 2795.
18. C. Kokkinos, A. Economou, I. Raptis, C. E. Efstathiou, Electrochim. Acta 2008, 53, 529.
19. C. Kokkinos, A. Economou, M. Koupparis, Talanta 2009, 77, 1138.
20. J. Musil, J. Matouš, J. Vlček, L. Koydl, K. Müller, Czech. J. Phys. 1994, 44, 565.
21. T.-H. Lu, H.-Y. Yang, I. Wen Sun, Talanta 1999, 49, 59.
22. J.-M. Zen, J.-W Wu, Electroanalysis 2005, 9, 302.
23. N. Spano, A. Panzanelli, P. C. Piu, M. I. Pilo, G. Sanna, R. Seeber, A. Tapparo, Anal. Chim. Acta 2005, 553, 201.
24. J. Wang, R. P. Deo, S. Thongngamdee, B. Ogorevc, Electroanalysis 2001,13, 1153.
25. G. Kefala, A. Economou, A. Voulgaropoulos, Analyst 2004, 129, 1082.