Effect of surface-active compounds on the stripping voltammetric response of bismuth film electrodes

Electroanalysis

Volumn 13, Issue 14, 2001, Pages 1153-1156

  Wang, Joseph ^a   Deo, Randhir Prakash ^a   Thongngamdee, Sompong ^a   Ogorevc, Bozidar ^b  

^a NEW MEXICO STATE UNIVERSITY   (United States)

^b NATIONAL INSTITUTE OF CHEMISTRY   (Slovenia)

Author keywords

Bismuth electrodes; Lead; Nafion; Stripping voltammetry; Surfactants; Trace metals

Indexed keywords

BISMUTH; ELECTRODES; METAL IONS; STRIPPING VOLTAMMETRY; TRACE ELEMENTS;

BISMUTH ELECTRODE; BISMUTH-FILM ELECTRODE; LEAD; MODEL SURFACE; NAFIONS; STRIPPING VOLTAMMETRY; SURFACE-ACTIVE COMPOUNDS; TRACE METAL; TRITON X-100; VOLTAMMETRIC RESPONSE;

SURFACE ACTIVE AGENTS;

ALBUMIN; BISMUTH; CADMIUM; GELATIN; HUMIC ACID; LEAD; METAL ION; SURFACTANT; TRACE METAL; TRITON X 100;

ADSORPTION; ANODIC STRIPPING POTENTIOMETRY; ARTICLE; ELECTRODE; EQUILIBRIUM CONSTANT; FILM;

EID: 0034757866     PISSN: 10400397     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4109(200110)13:14<1153::AID-ELAN1153>3.0.CO;2-I     Document Type: Article

References (5)

1. J. Wang, Stripping Analysis: Principles, Instrumentation and Applications, VCH Publishers, Deerfield Beach, FL 1985.
2. J. Wang, B. Tian, Anal. Chem. 1993, 65, 1529.
3. M.A. Nolan, S.P. Kounaves, Anal. Chem. 1999, 71, 3567.
4. J. Wang, J. Lu, S. Hocevar, P. Farias, B. Ogorevc, Anal. Chem. 2000, 72, 3218.
5. J. Wang, J. Lu, S. Hocevar, B. Ogorevc, Electroanalysis 2001, 13, 13.