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Journal of Applied Physics

Volumn 108, Issue 10, 2010, Pages

Control of the local devitrification on oxyfluoride glass doped with Er3+ ions under diode laser irradiation

(5) Gonzalez Prez S a Martin I R a Jaque, D b Haro Gonzalez P a Capuj, N a

a UNIVERSIDAD DE LA LAGUNA (Spain)

b UNIVERSIDAD AUTÓNOMA DE MADRID (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CONVENTIONAL FURNACE; DEVITRIFICATION PROCESS; DIODE LASER IRRADIATION; ERBIUM DOPED; FLUORESCENCE INTENSITY RATIO; GLASS STRUCTURE CHANGE; IRRADIATED ZONES; LASER ACTION; LASER IRRADIATIONS; LASER POWER; OXY-FLUORIDE GLASS; POWER DEPENDENCE; UP-CONVERSION EMISSION;

ERBIUM; FLUORESCENCE; GLASS CERAMICS; GLASS TRANSITION; IRRADIATION; LEAD;

GLASS LASERS;

EID: 78650261375 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3504857 Document Type: Conference Paper

Times cited : (3)

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