Nanocrystals distribution inside the writing lines in a glass matrix using Argon laser irradiation

Optics Express

Volumn 18, Issue 2, 2010, Pages 582-590

  Haro Gonzalez P ^a   Martin I R ^a,b   Creus, Alberto Hernández ^a  

^a UNIVERSIDAD DE LA LAGUNA   (Spain)

^b Instituto Univ de Materiales y Nanotecnología   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ARGON LASERS; BARIUM; BARIUM COMPOUNDS; CHEMICAL MODIFICATION; GAS LASERS; GLASS; HEATING; HOLMIUM; IRRADIATION; NANOCRYSTALS; NIOBIUM COMPOUNDS; OPTICAL PROPERTIES; OPTICAL SYSTEMS; STRONTIUM; STRONTIUM COMPOUNDS;

AR-LASER; ARGON LASER; ATOMIC FORCE MICROSCOPE IMAGES; GLASS MATRICES; LASER IRRADIATIONS; MELT QUENCHING METHOD; NONRADIATIVE PROCESS; STRONTIUM BARIUM NIOBATE;

GLASS LASERS;

ARGON; GLASS; NANOMATERIAL; NIOBIUM;

ARTICLE; CHEMISTRY; CRYSTALLIZATION; LASER; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; RADIATION EXPOSURE; REFRACTOMETRY; ULTRASTRUCTURE;

ARGON; CRYSTALLIZATION; GLASS; LASERS; MATERIALS TESTING; NANOSTRUCTURES; NIOBIUM; PARTICLE SIZE; REFRACTOMETRY;

EID: 75249084300     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.000582     Document Type: Article

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