Field emission enhancement and microstructural changes of carbon films by single pulse laser irradiation

Carbon

Volumn 49, Issue 3, 2011, Pages 1018-1024

  Shakerzadeh, M ^a   Xu, N ^a   Bosman, M ^b   Tay, B K ^a   Wang, X ^c   Teo, E H T ^a   Zheng, H ^c   Yu, H ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

^c SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

248 NM EXCIMER LASER; EMISSION ENHANCEMENT; EMISSION THRESHOLD FIELDS; FE PROPERTIES; FIELD EMISSION PROPERTY; FIELD ENHANCEMENT; LASER ENERGIES; LOW-ENERGY LASER IRRADIATION; MATRIX; MEDIUM ENERGY; MICROSTRUCTURAL CHANGES; NANOSECOND LASER PULSE; PARALLEL PLATES; PULSE WIDTH; SINGLE PULSE; SINGLE-PULSE LASER; THRESHOLD FIELDS;

AMORPHOUS CARBON; AMORPHOUS FILMS; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISSIPATION; EXCIMER LASERS; FIELD EMISSION; GAS LASERS; IRRADIATION; LASER BEAM EFFECTS; RAMAN SPECTROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

CARBON FILMS;

EID: 78650246990     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2010.11.010     Document Type: Article

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