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Volumn 354, Issue 1, 2011, Pages 386-395
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Simulations of novel nanostructures formed by capillary effects in lithography
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Author keywords
Capillary Force Lithography; Contact angle; Corner rounding; Star shaped capillary; Three dimensional meniscus
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Indexed keywords
CAPILLARY EFFECTS;
CAPILLARY FORCE LITHOGRAPHY;
CORNER ANGLE;
CORNER ROUNDING;
CROSS SECTION;
CROSS-SECTION GEOMETRY;
HEIGHT VARIATION;
HIGH ASPECT RATIO;
LITHOGRAPHY SYSTEMS;
NANOSCALE STRUCTURE;
PLASMONICS;
REGULAR POLYGON;
ROUNDED CORNERS;
SCALING ANALYSIS;
SMALL SIZE;
SUBMICRON;
THREE-DIMENSIONAL MENISCUS;
THREE-DIMENSIONAL NANOSTRUCTURES;
THREE-DIMENSIONAL SHAPE;
ASPECT RATIO;
CAPILLARITY;
CONTACT ANGLE;
CONTACTS (FLUID MECHANICS);
FLUID MECHANICS;
LITHOGRAPHY;
NANOSTRUCTURES;
THREE DIMENSIONAL COMPUTER GRAPHICS;
THREE DIMENSIONAL;
NANOMATERIAL;
ANALYTIC METHOD;
ARTICLE;
CAPILLARY FORCE LITHOGRAPHY;
CONTACT ANGLE;
EFFECT SIZE;
NONHUMAN;
PHOTON;
PRIORITY JOURNAL;
RADIUS;
SIMULATION;
SURFACE TENSION;
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EID: 78650178431
PISSN: 00219797
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcis.2010.10.030 Document Type: Article |
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Times cited : (14)
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References (20)
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