The etchback selective emitter technology and its application to multicrystalline silicon

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2010, Pages 1309-1314

  Book, F ^a   Braun, S ^a   Herguth, A ^a   Dastgheib Shirazi, A ^a   Raabe, B ^a   Hahn, G ^a  

^a UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDIC SOLUTIONS; BASE MATERIAL; CELL EFFICIENCY; DOPING PROFILES; ETCHING BEHAVIOR; HIGH RESOLUTION; HIGH-SHEET-RESISTANCE EMITTER; LARGE-AREA SOLAR CELLS; MULTI-CRYSTALLINE SILICON; PHOSPHOROUS CONCENTRATIONS; REFLECTANCE MEASUREMENTS; SATURATION CURRENT; SELECTIVE EMITTERS; SEM IMAGING;

GRAIN BOUNDARIES; PHOSPHORUS; PHOTOVOLTAIC EFFECTS; POLYSILICON; REFLECTION; SHEET RESISTANCE;

ELECTRIC RESISTANCE;

EID: 78650128870     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2010.5614267     Document Type: Conference Paper

References (3)

1. rd IEEE PVSC, San Diego, 2008.
2. rd EU PVSEC, Valencia, 2008, 1197.
3. th EU PVSEC, Hamburg, 2009, 1719.