Minimizing the electrical losses on the front side: Development of a selective emitter process from a single diffusion

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2008, Pages

  Haverkamp, Helge ^a   Dastgheib Shirazi, Amir ^a   Raabe, Bernd ^a   Book, Felix ^a   Hahn, Giso ^a,b  

^a UNIVERSITY OF KONSTANZ   (Germany)

^b FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL LOSS; ETCH BARRIERS; FILL FACTOR; MULTI-CRYSTALLINE SILICON SOLAR CELLS; OVERALL EFFICIENCY; SELECTIVE EMITTERS; SINGLE DIFFUSION; WET CHEMICAL ROUTE;

OPEN CIRCUIT VOLTAGE;

WET ETCHING;

EID: 84879712633     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2008.4922443     Document Type: Conference Paper

References (2)

1. A. Zerga, A. Siaoui, J. C. Muller, B. Bazer-Bachi, D. Ballutaud, N. La Quang and G. Goaer, Selective emitter formation for large scale industrially mc-Si solar cells by hydrogen plasma and we etching, Proc. 21 st EC PVSEC, Dresden 2006.
2. P. Choulat, F. Duerinckx, E. Van Kerschaver, F. Dross, G. Beaucarne, Minimizing the Dead layer of Industrial Phosphorous Emitters Formed by POCI3 Diffusion, Proc. 1Sth PVSEC-1S, Shanghai, 200S