Effect of post-deposition annealing on the performance of D.C. sputtered Cu2SnSe3 thin films

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 1, 2010, Pages

  Kuo, Dong Hau ^a   Haung, Wei Di ^a   Huang, Ying Sheng ^a   Wu, Jiun De ^a   Lin, Yan Jih ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

D.C. sputtering; Hall measurement; Solar cell

Indexed keywords

ABSORPTION COEFFICIENTS; ABSORPTION LAYER; ANNEALING TEMPERATURES; D.C. SPUTTERING; DIFFERENT PROCESS; DIRECT BAND GAP; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL MOBILITY; ELECTRICAL RESISTIVITY; GRAIN SIZE; HALL MEASUREMENTS; HIGHER TEMPERATURES; POST DEPOSITION ANNEALING; SPUTTERED FILMS; SPUTTERING TARGET; TARGET COMPOSITION; THIN-FILM SOLAR CELLS;

ABSORPTION; ANNEALING; CARRIER CONCENTRATION; ELECTRIC CONDUCTIVITY; OPTICAL PROPERTIES; SINTERING; SOLAR CELLS; SURFACE STRUCTURE; THIN FILMS; VAPOR DEPOSITION;

SEMICONDUCTING SELENIUM COMPOUNDS;

EID: 78649980092     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.07.067     Document Type: Article

References (17)

1. Contreras M.A., Ramanathan K., Abushama J., Hasoon F., Young D.L., Egaas B., Noufi R. Prog. Photovoil. Res. Appl. 2005, 13:209.
2. Repins I., Contreras M.A., Egaas B., Hart C., Scharf J., Perkins C.L., To B., Noufi R. Prog. Photovolt. Res. Appl. 2008, 16:235.
3. Matsushita H., Maeda T., Katsui A., Takizava T. J. Cryst. Growth 2000, 208:416.
4. Katagiri H., Jimbo K., Maw W.S., Oishi K., Yamazaki M., Araki H., Takeuchi A. Thin Solid Films 2009, 517:2455.
5. Jimbo K., Kimura R., Kamimura T., Yamada S., Maw W.S., Araki H., Oishi K., Katagiri H. Thin Solid Films 2007, 515:5997.
6. Katagiri H., Jimbo K., Yamada S., Kamimura T., Maw W.S., Fukano T., Ito T., Motohiro T. Appl. Phys. Express 2008, 1:041201.
7. Ramanathan K., Teeter G., Keane J.C. Thin Solid Films 2005, 480:499.
8. Zhang L., He Q., Jiang W.L., Liu F.F., Li C.J., Sun Y. Sol. Energy Mater. Sol. Cells 2009, 93:114.
9. Ishizuka S., Shibata H., Yamada A., Fons P., Sakurai K., Matsubara K., Niki H. Appl. Phys. Lett. 2007, 91:041902.
10. Babu G.S., Kumar Y.B.K., Haskar P.U., Raja V.S. Semicond. Sci. Technol. 2008, 23:085023.
11. Shafarman W.N., Zhu J. Thin Solid Films 2000, 361-362:473.
12. Lammer M., Klemm U., Powalla M. Thin Solid Films 2001, 387:33.
13. Wibowo R.A., Kim W.S., Lee E.S., Munir B., Kim K.H. J. Phys. Chem. Solids 2007, 68:1908.
14. Müller J., Nowoczin J., Schmitt H. Thin Solid Films 2006, 496:364.
15. Ramanathan K., Teeter G., Keane J.C., Noufi R. Thin Solid Films 2005, 480-481:499.
16. Wieting R., Gay R., Nguyen H., Palm J., Rischmiller C., Seapan A., Tarrant D., Willett D. Proceedings of the 31st Photovoltaic Specialists Conference, Hawaii 2005, 177.
17. Dimmler B., Powalla M., Schaetter R. Proceedings of the 31st Photovoltaic Specialists Conference, Hawaii 2005, 189.