Electrochromic performance of reactive plasma-sputtered NiOx thin films on flexible PET/ITO substrates for flexible electrochromic devices

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 1, 2010, Pages

  Lin, Yung Sen ^a   Chen, Po Wen ^a   Lin, Di Jiun ^a   Chuang, Pei Ying ^a   Tsai, Tsung Hsien ^a   Shiah, Yui Chuin ^a   Yu, Yueh Chung ^b  

^a FENG CHIA UNIVERSITY   (Taiwan)

^b INSTITUTE OF PHYSICS   (Taiwan)

Author keywords

Cyclic voltammetry; Electrochromism; Flexible substrate; Nickel oxide; Sputter

Indexed keywords

DEINTERCALATION; ELECTROCHROMIC PERFORMANCE; ELECTROCHROMIC PROPERTIES; FLEXIBLE ELECTROCHROMIC DEVICE; FLEXIBLE SUBSTRATE; ION INTERCALATION; ITO (INDIUM-TIN OXIDE); LOW DRIVING VOLTAGE; OPTICAL DENSITIES; OXYGEN GAS; PROPYLENE CARBONATE; RADIO FREQUENCIES; REACTIVE PLASMAS; ROOM TEMPERATURE; SPUTTER; THIN FILMS-SPUTTERED;

ARGON; BIOELECTRIC PHENOMENA; ELECTROCHROMIC DEVICES; ELECTROCHROMISM; INDIUM COMPOUNDS; NICKEL; NICKEL OXIDE; OXIDE FILMS; OXYGEN; POLYETHYLENE TEREPHTHALATES; PROPYLENE; SUBSTRATES; THERMOPLASTICS; THIN FILMS; TIN; TIN OXIDES;

CYCLIC VOLTAMMETRY;

EID: 78649946388     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.07.088     Document Type: Article

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