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1
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0020977115
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Neutral and ionized cesium bombardment type negative ion source
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H. Tsuji, T. Taya, J. Ishikawa and T. Takagi, "Neutral and Ionized Cesium Bombardment Type Negative Ion Source", Prof, of the International Ion Engineering Congress, ICIS'83&IPAT'83, IEEEJ, Vol.1, pp.141-144, 1983.
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(1983)
Prof, of the International Ion Engineering Congress, ICIS'83&IPAT'83, IEEEJ
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Tsuji, H.1
Taya, T.2
Ishikawa, J.3
Takagi, T.4
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2
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5744223132
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Negative-ion production probability in RF plasma sputter-type heavy negative-ion source
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H. Tsuji, J. Ishikawa, Y. Kawabata, and Y. Gotoh, "Negative-Ion Production Probability in RF Plasma Sputter-Type Heavy Negative-Ion Source", Review of Scientific Instruments, Vol.65, pp. 1732-1736, 1994.
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Review of Scientific Instruments
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Tsuji, H.1
Ishikawa, J.2
Kawabata, Y.3
Gotoh, Y.4
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3
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0037790333
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RF plasma sputter-type DC-mode heavy negative ion source
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AIP Conf. Proc.
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H. Tsuji, J. Ishikawa, Y. Gotoh and Y. Okada, "RF Plasma Sputter-Type DC-Mode Heavy Negative Ion Source", Proc. of the 6th Int. Symposium on Production and Neutralization of Negative Ions and Beams, 1992, AIP Conf. Proc. No. 287, pp. 530-539, 1994.
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Proc. of the 6th Int. Symposium on Production and Neutralization of Negative Ions and Beams
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Tsuji, H.1
Ishikawa, J.2
Gotoh, Y.3
Okada, Y.4
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4
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0003873546
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High current RF-plasma-sputter-type heavy negative-ion source for negative-ion implanter
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Elsevier
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H. Tsuji, J. Ishikawa, Y. Okayama, Y. Toyota and Y. Gotoh, "High Current RF-Plasma-Sputter-Type Heavy Negative-Ion Source for Negative-Ion Implanter", Proc. of the 10th Int. Conf. on Implantation Technology -94, Elsevier, pp.495-498, 1995.
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Tsuji, H.1
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Toyota, Y.4
Gotoh, Y.5
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5
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0033348482
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Negative-ion implanter for powders and uniform implantation without particle scattering
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IEEE
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II. Tsuji, M. Mimura, S. Kido, Y. Gotoh and J. Ishikawa, "Negative-Ion Implanter for Powders and Uniform Implantation without Particle Scattering", Proc. of the 12th Int. Conf. on Ion Implantation Technology -98, IEEE, pp.1199-1204, 1999.
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Tsuji, H.1
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Gotoh, Y.4
Ishikawa, J.5
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6
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0001021421
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Charging voltage measurement of an isolated and insulators during negative-ion implantation
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Elsevier
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H. Tsuji, Y. Toyota, J. Ishikawa, S. Sakai, Y. Okayama, S. Nagumo, Y. Gotoh, and K. Matsuda, "Charging Voltage Measurement of An Isolated and Insulators during Negative-Ion Implantation", Proc. of the 10th Int. Conf. on Ion Implantation Technololgy-94', Elsevier, pp.612-615, 1995.
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(1995)
Proc. of the 10th Int. Conf. on Ion Implantation Technololgy
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Tsuji, H.1
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Ishikawa, J.3
Sakai, S.4
Okayama, Y.5
Nagumo, S.6
Gotoh, Y.7
Matsuda, K.8
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7
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0001878342
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Negative-ion implantation technique
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J. Ishikawa, H. Tsuji, Y. Toyota, Y. Gotoh, K. Matsuda, M. Tanjyo, and S. Sakai, "Negative-Ion Implantation Technique", Nuclear Instruments and Methods in Physics Research B, Vol. B96,pp.7-12, 1995
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(1995)
Nuclear Instruments and Methods in Physics Research B
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Ishikawa, J.1
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Toyota, Y.3
Gotoh, Y.4
Matsuda, K.5
Tanjyo, M.6
Sakai, S.7
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8
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0031547773
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Slightly negative surface potential and charging model of insulator in negative-ion implantation
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H. Tsuji, J. Ishikawa, S. Ikcda, and Y. Gotoh, "Slightly Negative Surface Potential and Charging Model of Insulator in Negative-Ion Implantation", Nuclear Instruments and Methods in Physics Research B, Vol.B127/128, pp.278-281, 1997.
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(1997)
Nuclear Instruments and Methods in Physics Research B
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Tsuji, H.1
Ishikawa, J.2
Ikcda, S.3
Gotoh, Y.4
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9
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0030564306
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Fundamental study on powder-scattering in positive- and negative-ion implantation into powder materials
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H. Tsuji, J. Ishikawa, H. Itoh, Y. Toyota, and Y. Gotoh, "Fundamental Study on Powder-Scattering in Positive- and Negative-Ion Implantation into Powder Materials", Applied Surface Science, Vol. 100/101, pp.342-346, 1996.
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(1996)
Applied Surface Science
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Tsuji, H.1
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Toyota, Y.4
Gotoh, Y.5
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