|
Volumn , Issue , 2007, Pages 183-185
|
The quantum confined stark effect in Ge/SiGe quantum wells: An efficient electroabsorption mechanism for silicon-based applications
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ABSORPTION COEFFICIENTS;
ELECTRO-ABSORPTION;
GE/SIGE QUANTUM WELLS;
LOW POWER;
QUANTUM CONFINED STARK EFFECT;
SILICON ELECTRONICS;
SILICON-BASED;
SEMICONDUCTOR QUANTUM WELLS;
SPECTROSCOPY;
STARK EFFECT;
PHOTONICS;
|
EID: 78649838316
PISSN: 19492081
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (1)
|
References (6)
|