Deep-UV lithography fabrication of slot waveguides and sandwiched waveguides for nonlinear applications

IEEE International Conference on Group IV Photonics GFP

Volumn , Issue , 2007, Pages 222-224

  Jordana, E ^a   Fedeli, J M ^a   Lyan, P ^a   Colonna, J P ^a   Gautier, P ^a   Daldosso, N ^b   Pavesi, L ^b   Lebour, Y ^c   Pellegrino, P ^c   Garrido, B ^c   Blasco, J ^d   Cuesta Soto, F ^d   Sanchis, P ^d  

^a CEA LETI   (France)

^b UNIVERSITY OF TRENTO   (Italy)

^c UNIVERSITY OF BARCELONA   (Spain)

^d UNIVERSITAT POLITÈCNICA DE VALÈNCIA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ALL-OPTICAL; DEEP-UV LITHOGRAPHY; DUV LITHOGRAPHY; LOW LOSS; NONLINEAR APPLICATIONS; SILICON NANOCRYSTALS; SLOT WAVEGUIDE;

LOGIC GATES; MICROELECTRONICS; WAVEGUIDES;

PHOTONICS;

EID: 78649834370     PISSN: 19492081     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

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3. CA. Barrios, Optics Express, 12(15), pp3353-3366, 2004
4. P. Sanchis & al, IEEE J. of Lightwave Technol, vol. 25, no 5, May 2007.
5. Q. Xu, & al, Optics Letters 29, pp1626-1628, 2004
6. R. Orobtchouk, & al, Spie The International Society For Optical Engineering, Vol 6183, p 618304, 2006