Transition behavior of PS-b-PMMA films on the balanced interfacial interactions

Polymer

Volumn 51, Issue 26, 2010, Pages 6313-6318

  Kim, Eunhye ^a   Choi, Seunghoon ^a   Guo, Rui ^a   Ryu, Du Yeol ^a   Hawker, Craig J ^b   Russell, Thomas P ^c  

^a Yonsei University   (South Korea)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

Block copolymers; Thin film; Transition behavior

Indexed keywords

ACRYLIC MONOMERS; BLOCK COPOLYMERS; ESTERS; GRAFTING (CHEMICAL); POLYMETHYL METHACRYLATES; X RAY SCATTERING;

COMPOSITIONAL FLUCTUATIONS; GRAZING INCIDENCE SMALL-ANGLE X-RAY SCATTERING; INTERFACIAL INTERACTION; LAMELLAR MICRODOMAINS; ORDER-TO-DISORDER TRANSITIONS; POLYSTYRENE-B-POLY(METHYL METHACRYLATE); THICKNESS DEPENDENCE; TRANSITION BEHAVIOR;

THIN FILMS;

EID: 78649749744     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2010.10.055     Document Type: Article

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