메뉴 건너뛰기




Volumn 205, Issue 7, 2010, Pages 2218-2224

A comparison between the corrosion behavior of nanostructured copper thin films deposited on oxidized silicon and copper sheet in alkaline media

Author keywords

Copper; Corrosion; Nanostructured

Indexed keywords

ALKALINE MEDIA; BREAKDOWN POTENTIAL; CHEMICAL COMPOSITIONS; COPPER PROTECTION; COPPER SHEETS; COPPER THIN FILM; CORROSION BEHAVIOR; CORROSION CURRENT DENSITIES; CRYSTALLINE STRUCTURE; DEPOSITED FILMS; HYDROXYL ION; IMMERSION TESTS; NANO-STRUCTURED; NANOSTRUCTURED COPPER; OXIDIZED SILICON; PASSIVE LAYER; POLARIZATION TESTS; SEM; SUBSTRATE TEMPERATURE; XRD; XRD PATTERNS;

EID: 78649741351     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.08.145     Document Type: Article
Times cited : (24)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.