|
Volumn 205, Issue 7, 2010, Pages 2218-2224
|
A comparison between the corrosion behavior of nanostructured copper thin films deposited on oxidized silicon and copper sheet in alkaline media
|
Author keywords
Copper; Corrosion; Nanostructured
|
Indexed keywords
ALKALINE MEDIA;
BREAKDOWN POTENTIAL;
CHEMICAL COMPOSITIONS;
COPPER PROTECTION;
COPPER SHEETS;
COPPER THIN FILM;
CORROSION BEHAVIOR;
CORROSION CURRENT DENSITIES;
CRYSTALLINE STRUCTURE;
DEPOSITED FILMS;
HYDROXYL ION;
IMMERSION TESTS;
NANO-STRUCTURED;
NANOSTRUCTURED COPPER;
OXIDIZED SILICON;
PASSIVE LAYER;
POLARIZATION TESTS;
SEM;
SUBSTRATE TEMPERATURE;
XRD;
XRD PATTERNS;
COPPER;
CORROSION RESISTANCE;
CORROSIVE EFFECTS;
CRYSTAL ORIENTATION;
DEPOSITS;
ELECTROCHEMICAL CORROSION;
ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY;
MORPHOLOGY;
POLARIZATION;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON OXIDES;
THIN FILMS;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
COPPER DEPOSITS;
|
EID: 78649741351
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2010.08.145 Document Type: Article |
Times cited : (24)
|
References (25)
|