Forming silver conductive thick films by microwave heating

Journal of the American Ceramic Society

Volumn 93, Issue 10, 2010, Pages 3201-3205

  Hwang, Seongjin ^a   Veronesi, Paolo ^b   Leonelli, Cristina ^b   Kim, Hyungsun ^a  

^a Inha University   (South Korea)

^b UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AG DIFFUSION; CONVENTIONAL HEATING; DIELECTRIC SUBSTRATES; GLASS FRIT; MICROWAVE TREATMENT; MICROWAVE-ASSISTED; POWDER MIXTURES; PROCESSING TIME; RAPID PROCESSING; SINGLE-MODE MICROWAVES; SUBSTRATE TEMPERATURE;

CONDUCTIVE FILMS; ENERGY EFFICIENCY; GLASS; HEATING; MICROWAVE HEATING; MICROWAVES; SUBSTRATES; THICK FILMS; VAPOR DEPOSITION;

SILVER;

EID: 78649595858     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2010.03914.x     Document Type: Article

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