On the measurement of thickness in nanoporous materials by EELS

Ultramicroscopy

Volumn 111, Issue 1, 2010, Pages 62-65

  Jiang, Nan ^a   Su, Dong ^a,b   Spence, John C H ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

EELS; Nanoporous; Thickness

Indexed keywords

BULK SYSTEM; EELS; LOG-RATIO METHOD; MATRIX; MEAN-FREE PATH; NANOPOROUS; NANOPOROUS MATERIALS; NANOPOROUS SYSTEM; THICKNESS;

POROUS MATERIALS; THICKNESS MEASUREMENT;

ELECTRON ENERGY LOSS SPECTROSCOPY;

MAGNESIUM OXIDE;

ARTICLE; CONTROLLED STUDY; DECELERATION; DIELECTRIC CONSTANT; ELECTRON BEAM; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY RESOURCE; EXCITATION; POISSON DISTRIBUTION; POROSITY; SCANNING TRANSMISSION ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 78649476260     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2010.09.011     Document Type: Article

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