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Volumn 26, Issue 10, 2010, Pages 872-877

ZnO:Al films prepared by reactive mid-frequency magnetron sputtering with rotating cathode

Author keywords

Al doped zinc oxide; Mid frequency magnetron sputtering; Properties

Indexed keywords

AL-DOPED ZINC OXIDE; AZO FILMS; COLUMNAR STRUCTURES; DEPOSITION MODES; DEPOSITION PARAMETERS; ELECTRICAL AND OPTICAL PROPERTIES; GAS PRESSURES; GLASS SUBSTRATES; GRAIN SURFACE; MAGNETRON SPUTTERING PROCESS; METALLIC SURFACE; MID-FREQUENCY; OXYGEN PARTIAL PRESSURE; PROPERTIES; REDEPOSITION; ROTATING CATHODE; SUBSTRATE TEMPERATURE; TARGET SURFACE; ZNO; ZNO:AL FILMS;

EID: 78649392898     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1005-0302(10)60139-9     Document Type: Article
Times cited : (10)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.