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Volumn 26, Issue 10, 2010, Pages 872-877
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ZnO:Al films prepared by reactive mid-frequency magnetron sputtering with rotating cathode
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Author keywords
Al doped zinc oxide; Mid frequency magnetron sputtering; Properties
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Indexed keywords
AL-DOPED ZINC OXIDE;
AZO FILMS;
COLUMNAR STRUCTURES;
DEPOSITION MODES;
DEPOSITION PARAMETERS;
ELECTRICAL AND OPTICAL PROPERTIES;
GAS PRESSURES;
GLASS SUBSTRATES;
GRAIN SURFACE;
MAGNETRON SPUTTERING PROCESS;
METALLIC SURFACE;
MID-FREQUENCY;
OXYGEN PARTIAL PRESSURE;
PROPERTIES;
REDEPOSITION;
ROTATING CATHODE;
SUBSTRATE TEMPERATURE;
TARGET SURFACE;
ZNO;
ZNO:AL FILMS;
ALUMINUM;
ELECTRIC PROPERTIES;
FILM PREPARATION;
MAGNETRON SPUTTERING;
OPTICAL PROPERTIES;
OXYGEN;
ROTATION;
SUBSTRATES;
ZINC;
ZINC OXIDE;
OXIDE FILMS;
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EID: 78649392898
PISSN: 10050302
EISSN: None
Source Type: Journal
DOI: 10.1016/S1005-0302(10)60139-9 Document Type: Article |
Times cited : (10)
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References (15)
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