Fabrication of a Si nanowire arrayed waveguide grating

Guangdianzi Jiguang/Journal of Optoelectronics Laser

Volumn 21, Issue 10, 2010, Pages 1431-1434

  Zhang, Jia Shun ^a   An, Jun Ming ^a   Zhao, Lei ^a   Song, Shi Jiao ^a   Wu, Yuan Da ^a   Hu, Xiong Wei ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

Arrayed waveguide grating(AWG); Electron beam lithography(EBL); Finite difference time domain(FDTD); Si on insulator(SOI) nanowire waveguide

Indexed keywords

CENTRAL CHANNELS; CHANNEL SPACINGS; DEMULTIPLEXERS; ELECTRON BEAM LITHOGRAPHY(EBL); ERROR RANGE; FINITE DIFFERENCE TIME DOMAINS; OUTPUT OPTICAL FIELDS; SI NANOWIRE; SI-ON-INSULATOR; SIMULATED RESULTS; TEST RESULTS; TRANSMISSION FUNCTION; TRANSMISSION SPECTRUMS;

CROSSTALK; DEMULTIPLEXING; ELECTROMAGNETIC INDUCTION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; FABRICATION; FINITE DIFFERENCE TIME DOMAIN METHOD; INDUCTIVELY COUPLED PLASMA; NANOWIRES; OPTICAL WAVEGUIDES; SILICON; WAVEGUIDES;

ARRAYED WAVEGUIDE GRATINGS;

EID: 78649338470     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

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