Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6996, Issue , 2008, Pages

  Horst, F ^a   Green, William M J ^b   Offrein, B J ^a   Vlasov, Yurii ^b  

^a IBM RESEARCH ZURICH   (Switzerland)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Demultiplexer; Echelle; Grating; Optical; Silicon on Insulator; SOI; WDM

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER NETWORKS; DIFFRACTION GRATINGS; INTEGRATED CIRCUITS; INTEGRATED OPTOELECTRONICS; MULTIPLEXING; MULTIPLEXING EQUIPMENT; OPTICAL DATA PROCESSING; OPTICAL WAVEGUIDES; PHOTONIC DEVICES; SILICON; WAVEGUIDES; WAVELENGTH DIVISION MULTIPLEXING;

DEMULTIPLEXER; ECHELLE; GRATING; OPTICAL; SILICON ON INSULATOR; SOI; WDM;

SILICON ON INSULATOR TECHNOLOGY;

EID: 50349091230     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.781232     Document Type: Conference Paper

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