High-fidelity conformation of graphene to SiO2 topographic features

Physical Review Letters

Volumn 105, Issue 21, 2010, Pages

  Cullen, W G ^a   Yamamoto, M ^a   Burson, K M ^a   Chen, J H ^a   Jang, C ^a   Li, L ^a   Fuhrer, M S ^a   Williams, E D ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGETIC ANALYSIS; HIGH FIDELITY; HIGH RESOLUTION; LENGTH SCALE; NONCONTACT ATOMIC FORCE MICROSCOPY; STRAIN ENGINEERING; TOPOGRAPHIC FEATURES;

ADHESION; ATOMIC FORCE MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SILICON COMPOUNDS;

GRAPHENE;

EID: 78649307597     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.105.215504     Document Type: Article

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