Photochemistry of aqueous C60 clusters: Wavelength dependency and product characterization

Environmental Science and Technology

Volumn 44, Issue 21, 2010, Pages 8121-8127

  Hou, Wen Che ^a,d   Kong, Lingjun ^b   Wepasnick, Kevin A ^c   Zepp, Richard G ^b   Fairbrother, D Howard ^c   Jafvert, Chad T ^a  

^a PURDUE UNIVERSITY   (United States)

^b U S ENVIRONMENTAL PROTECTION AGENCY   (United States)

^c JOHNS HOPKINS UNIVERSITY   (United States)

^d Arizona State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

[CARBONYL; ASSESSMENT MODELS; CARBON ATOMS; CARBON STRUCTURES; CARBOXYL GROUPS; ELECTRON SYSTEMS; ENGINEERED NANOMATERIALS; FTIR; LONG WAVELENGTH; MONOCHROMATIC LIGHT; NATURAL ENVIRONMENTS; NATURAL SUNLIGHT; NMR ANALYSIS; PHOTOPRODUCTS; PHOTOTRANSFORMATIONS; PRODUCT CHARACTERIZATIONS; SOLUBLE C; TOF MASS SPECTROMETRY; TRANSFORMATION PATHWAYS; VINYL ETHERS; VISIBLE LIGHT; WAVELENGTH DEPENDENCY;

ATOMIC SPECTROSCOPY; ETHERS; FUNCTIONAL GROUPS; MASS SPECTROMETRY; MONOCHROMATORS; OXYGEN; QUANTUM YIELD; X RAY PHOTOELECTRON SPECTROSCOPY;

RISK ASSESSMENT;

CARBON 13; CARBONYL DERIVATIVE; CARBOXYL GROUP; FUNCTIONAL GROUP; OXYGEN;

CARBONYL COMPOUND; FTIR SPECTROSCOPY; IRRADIATION; MASS SPECTROMETRY; NUCLEAR MAGNETIC RESONANCE; PHOTOCHEMISTRY; RISK ASSESSMENT; VISIBLE SPECTRUM; WAVELENGTH;

AQUEOUS C 60 CLUSTER; AQUEOUS SOLUTION; ARTICLE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; IRRADIATION; PHOTOCHEMISTRY; PHOTOREACTIVITY; QUANTUM YIELD; SPECTRAL SENSITIVITY; SUNLIGHT;

ENVIRONMENTAL POLLUTANTS; FULLERENES; MAGNETIC RESONANCE SPECTROSCOPY; MASS SPECTROMETRY; OXYGEN; PHOTOCHEMICAL PROCESSES; RISK ASSESSMENT; SUNLIGHT;

EID: 78549235146     PISSN: 0013936X     EISSN: 15205851     Source Type: Journal    
DOI: 10.1021/es101230q     Document Type: Article

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