The oxygen permeation properties of nanocrystalline Ce O2 thin films

Journal of the Electrochemical Society

Volumn 157, Issue 12, 2010, Pages

  Brinkman, K S ^a   Takamura, H ^b   Tuller, H L ^c   Iijima, T ^d  

^a SAVANNAH RIVER NATIONAL LABORATORY   (United States)

^b TOHOKU UNIVERSITY   (Japan)

^c Massachusetts Institute of Technology   (United States)

^d NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON ADDITION; CERIA FILMS; DENSE FILMS; DESIGN PARAMETERS; ELECTRONIC CONDUCTIVITY; FUNCTIONAL MEMBRANES; HELIUM GAS; INTERMEDIATE TEMPERATURES; MEAN-GRAIN SIZE; NANOCRYSTALLINE CERIUM OXIDES; NANOCRYSTALLINES; OXYGEN FLUXES; OXYGEN PARTIAL PRESSURE; OXYGEN PERMEATION; OXYGEN SEPARATION; SIZE DEPENDENT; SOL GEL SOLUTIONS; SUPPORT SUBSTRATE;

CERIUM; CERIUM COMPOUNDS; HELIUM; MATERIALS PROPERTIES; NANOCRYSTALLINE MATERIALS; OXYGEN; SINTERING; SIZE SEPARATION; THIN FILMS;

GAS PERMEABLE MEMBRANES;

EID: 78449297029     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3503519     Document Type: Article

References (37)

1. H. Huang, T. Gur, Y. Saito, and F. Prinz, Appl. Phys. Lett. APPLAB 0003-6951, 89, 143107 (2006). 10.1063/1.2358851
2. I. Kagomiya, Y. Iijima, H. Kakuta, and H. Takamura, Electrochem. Solid-State Lett. ESLEF6 1099-0062, 8, A70 (2005). 10.1149/1.1828273
3. I. Kagomiya, T. Iijima, and H. Takamura, J. Membr. Sci. JMESDO 0376-7388, 286, 180 (2006). 10.1016/j.memsci.2006.09.032
4. P. Jasinski, T. Suzuki, and H. Anderson, Sens. Actuators B SABCEB 0925-4005, 96, 73 (2003). 10.1016/S0925-4005(03)00407-6
5. A. Tschope, J. Ying, and H. Tuller, Sens. Actuators B SABCEB 0925-4005, 31, 111 (1996). 10.1016/0925-4005(96)80025-6
6. Y.-M. Chiang, E. Lavik, I. Kosacki, H. Tuller, and J. Ying, Appl. Phys. Lett. APPLAB 0003-6951, 69, 185 (1996). 10.1063/1.117366
7. A. Tschope, E. Sommer, and R. Birringer, Solid State Ionics SSIOD3 0167-2738, 139, 255 (2001). 10.1016/S0167-2738(01)00678-6
8. J. Rupp and L. Gauckler, Solid State Ionics SSIOD3 0167-2738, 177, 2513 (2006). 10.1016/j.ssi.2006.07.033
9. T. Suzuki, I. Kosacki, and H. Anderson, Solid State Ionics SSIOD3 0167-2738, 151, 111 (2002). 10.1016/S0167-2738(02)00589-1
10. H. L. Tuller, Solid State Ionics SSIOD3 0167-2738, 131, 143 (2000). 10.1016/S0167-2738(00)00629-9
11. H. L. Tuller, S. J. Litzelman, and W. Jung, Phys. Chem. Chem. Phys. PPCPFQ 1463-9076, 11, 3023 (2009). 10.1039/b901906e
12. S. Kim and J. Maier, J. Am. Ceram. Soc. JACTAW 0002-7820, 24, 1919 (2004). 10.1016/S0955-2219(03)00525-9
13. N. Sata, K. Eberman, K. Eberl, and J. Maier, Nature (London) NATUAS 0028-0836, 408, 946 (2000). 10.1038/35050047
14. D. Meixner, D. Brengel, B. Henderson, J. Abrardo, M. Wilson, D. Taylor, and R. Cutler, J. Electrochem. Soc. JESOAN 0013-4651, 149, D132 (2002). 10.1149/1.1495908
15. U. Anselmi-Tamburini, F. Maglia, G. Chiodelli, A. Tacca, G. Spinolo, P. Riello, S. Bucella, and Z. Munir, Adv. Funct. Mater. AFMDC6 1616-301X, 16, 2363 (2006). 10.1002/adfm.200500415
16. N. Rane, H. Zou, G. Buelna, and J. Lin, J. Membr. Sci. JMESDO 0376-7388, 256, 89 (2005).
17. L. Kim, J. Kim, D. Jung, C. Park, C. ang, and Y. Roh, Thin Solid Films THSFAP 0040-6090, 360, 154 (2000). 10.1016/S0040-6090(99)01087-1
18. G. Chiodelli, L. Malavasi, V. Massarotti, P. Mustarelli, and E. Quartarone, Solid State Ionics SSIOD3 0167-2738, 176, 1505 (2005). 10.1016/j.ssi.2005.03.017
19. J. Rupp, A. Infortuna, and L. Gauckler, Acta Mater. ACMAFD 1359-6454, 54, 1721 (2006). 10.1016/j.actamat.2005.11.032
20. S. Suh, J. Guan, L. Miinea, J. Lehn, and D. Hoffman, Chem. Mater. CMATEX 0897-4756, 16, 1667 (2004). 10.1021/cm035392y
21. H. Zou, Y. Lin, N. Rane, and T. He, Ind. Eng. Chem. Res. IECRED 0888-5885, 43, 3019 (2004). 10.1021/ie030676d
22. W. S. Rasband, ImageJ, National Institutes of Health, Bethesda, http://rsb.info.nih.gov/ij/, 1997-2004, last accessed June 2009.
23. C. Wagner, Z. Phys. Chem. Abt. B ZPCBAL 0372-9664, 21, 25 (1993).
24. H. Takamura, K. Okumura, Y. Koshino, A. Kamegawa, and M. Okada, J. Electroceram. JOELFJ 1385-3449, 13, 613 (2004). 10.1007/s10832-004-5167-y
25. H. J. M. Bouwmeester, H. Kruidhof, and A. J. Burggraaf, Solid State Ionics SSIOD3 0167-2738, 72, 185 (1994). 10.1016/0167-2738(94)90145-7
26. H. W. Brinkman, J. Meijerink, K. J. de Vries, and A. J. Burggraaf, J. Am. Ceram. Soc. JACTAW 0002-7820, 16, 587 (1996). 10.1016/0955-2219(95)00173-5
27. Y. S. Lin, L. G. J. de Haart, K. J. de Vries, and A. J. Burggraaf, J. Electrochem. Soc. JESOAN 0013-4651, 137, 3960 (1990). 10.1149/1.2086337
28. K. Brinkman, T. Iijima, and H. Takamura, Mater. Res. Soc. Symp. Proc. MRSPDH 0272-9172, 1126, 1126 (2009).
29. S. Kim and J. Maier, J. Electrochem. Soc. JESOAN 0013-4651, 149, J73 (2002). 10.1149/1.1507597
30. D. Y. Wang, D. S. Park, J. Griffith, and A. S. Nowick, Solid State Ionics SSIOD3 0167-2738, 2, 95 (1981). 10.1016/0167-2738(81)90005-9
31. S. Kim, J. Fleig, and J. Maier, in Ionic and Mixed Conducting Ceramics IV, T. S. Ramamarayanan, W. L. Worrell, and, M. Mogensen, Editors, PV 2001-16, p. 208, The Electrochemical Society Proceedings, Pennington, NJ (2001).
32. S. J. Litzelman and H. L. Tuller, Solid State Ionics SSIOD3 0167-2738, 180, 1190 (2009). 10.1016/j.ssi.2009.05.013
33. H. Inaba and H. Tagawa, Solid State Ionics SSIOD3 0167-2738, 83, 1 (1996). 10.1016/0167-2738(95)00229-4
34. A. Karthikeyan and S. Ramanathan, Appl. Phys. Lett. APPLAB 0003-6951, 92, 243109 (2008). 10.1063/1.2938028
35. 2 s.
36. J. A. Lane and J. A. Kilner, Solid State Ionics SSIOD3 0167-2738, 136-137, 927 (2000). 10.1016/S0167-2738(00)00530-0
37. A. Tschope and R. Birringer, J. Electroceram. JOELFJ 1385-3449, 7, 169 (2001). 10.1023/A:1014483028210