Modeling of advanced oxidation of trace organic contaminants by hydrogen peroxide photolysis and fentons reaction

Industrial and Engineering Chemistry Research

Volumn 49, Issue 22, 2010, Pages 11331-11343

  Rojas, Mario R ^a   Pérez, Fernando ^a   Whitley, Daniel ^a   Arnold, Robert G ^a   Sáez, A Eduardo ^a  

^a University of Arizona   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADJUSTABLE PARAMETERS; ADVANCED OXIDATION; COMPLEX MATRICES; HYDROXYL RADICALS; LABORATORY SCALE; NONYLPHENOLS; OPERATING CONDITION; P-CRESOL; RADICAL INITIATIONS; RADICAL SCAVENGERS; RADICAL SCAVENGING; RECOMBINATION MECHANISMS; SECOND-ORDER RATE CONSTANTS; SOLUTION PH; TARGET COMPOUND; TRACE ORGANIC CONTAMINANTS;

BATCH REACTORS; CARBON DIOXIDE; HYDROGEN; HYDROGEN PEROXIDE; OXIDATION; PHENOLS; PHOTOLYSIS; RATE CONSTANTS;

REACTION KINETICS;

EID: 78449275197     PISSN: 08885885     EISSN: 15205045     Source Type: Journal    
DOI: 10.1021/ie101592p     Document Type: Article

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