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Volumn 2, Issue , 2002, Pages 195-197

Thermal property measurements of Giant Magnetoresistive (GMR) layers

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EID: 78249266921     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/IMECE2002-32782     Document Type: Conference Paper
Times cited : (1)

References (9)
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    • Data Storage Systems Center, Carnegie Mellon University, Pittsburgh, PA, Spring 2002 Review
    • Yang, Y., and Asheghi, M., 2002, "Nanoscale Heat Conduction in GMR Heads," Data Storage Systems Center, Carnegie Mellon University, Pittsburgh, PA, Spring 2002 Review.
    • (2002) Nanoscale Heat Conduction in GMR Heads
    • Yang, Y.1    Asheghi, M.2
  • 3
    • 0001292732 scopus 로고
    • Transient Thermoreflectance from Thin Metal Films
    • Paddock C.A. and Eesley, G.L., 1986, "Transient Thermoreflectance from Thin Metal Films," J. Appl. Phys., Vol.60, No.1, pp.285-90.
    • (1986) J. Appl. Phys. , vol.60 , Issue.1 , pp. 285-290
    • Paddock, C.A.1    Eesley, G.L.2
  • 4
    • 36549099049 scopus 로고
    • Thermal Conductivity Measurement from 30 to 750K: The 3ω Method
    • Cahill, D.G., 1990, "Thermal Conductivity Measurement from 30 to 750K: the 3ω Method," Rev. Sci. Instrum., Vol.61, No.2, pp.802-8.
    • (1990) Rev. Sci. Instrum. , vol.61 , Issue.2 , pp. 802-808
    • Cahill, D.G.1
  • 6
    • 18244390620 scopus 로고
    • Thermal Conductivity of Heavily Doped Low-Pressure Chemical Vapor Deposited Polycrystalline Silicon Films
    • Mastrangelo, C.H. and Muller, R.S., 1988, "Thermal Conductivity of Heavily Doped Low-Pressure Chemical Vapor Deposited Polycrystalline Silicon Films," J. Appl. Phys., Vol.63, No.5, pp.1442-7.
    • (1988) J. Appl. Phys. , vol.63 , Issue.5 , pp. 1442-1447
    • Mastrangelo, C.H.1    Muller, R.S.2
  • 7
    • 0035397356 scopus 로고    scopus 로고
    • 3 Omega method for specific heat and thermal conductivity measurements
    • DOI 10.1063/1.1378340
    • Lu, L., Yi, W., and Zhang, D.L., 2001, "3 Omega Method for Specific Heat and Thermal Conductivity Measurements," Rev. Sci. Instrum., Vol.72, No.7, pp.2996-03. (Pubitemid 33606704)
    • (2001) Review of Scientific Instruments , vol.72 , Issue.7 , pp. 2996-3003
    • Lu, L.1    Yi, W.2    Zhang, D.L.3
  • 8
    • 0032615074 scopus 로고    scopus 로고
    • Process-Dependent Thermal Transport Properties of Silicon-dioxide Films Deposited Using Low-pressure Chemical Vapor Deposition
    • Ju, Y.S. and Goodson, K.E., 1999, "Process-Dependent Thermal Transport Properties of Silicon-dioxide Films Deposited Using Low-pressure Chemical Vapor Deposition," J. Appl. Phys., Vol.85, No.9, pp.7130-4.
    • (1999) J. Appl. Phys. , vol.85 , Issue.9 , pp. 7130-7134
    • Ju, Y.S.1    Goodson, K.E.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.