Structural, electrical, and optical properties of reactively sputtered SnO2 thin films

Metals and Materials International

Volumn 16, Issue 3, 2010, Pages 441-446

  Kim, Sarah Eun Kyung ^a   Oliver, Manny ^b  

^a Seoul National University of Science and Technology   (South Korea)

^b MOTOROLA INC   (United States)

Author keywords

Conductivity; Electrical electronic materials; Oxides; Sputtering; Thin films

Indexed keywords

AMORPHOUS FILMS; CRYSTALLINITY; ELECTRIC CONDUCTIVITY; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXIDES; SPUTTERING;

DEPOSITION PARAMETERS; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL CONDUCTIVITY; ELECTRICAL/ELECTRONIC MATERIALS; HALL EFFECT MEASUREMENT; PROCESSING VARIABLES; REACTIVE RF MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 78149458147     PISSN: 15989623     EISSN: 20054149     Source Type: Journal    
DOI: 10.1007/s12540-010-0614-6     Document Type: Article

References (25)

1. K. Hillie and H. Swart, Appl. Surf. Sci. 253, 85136 (2007).
2. W.-P. Tai and K. Inoue, Mater. Lett. 57, 1508 (2003).
3. R. Deshmukh, S. Badadhe, M. Vaishampayan, and I. Mulla, Mater. Lett. 62, 4328-4331 (2008).
4. N. J. Kim, Y. H. La, H. I. Sang, W-T Han, and B. K. Ryu, Electron. Mater. Lett. 5, 209 (2009).
5. S. Samson and C. Fonstad, J. Appl. Phys. 44, 4618 (1973).
6. L. Roman, R. Valaski, C. Canestraro, E. Magalha, C. Persson, R. Ahuja, I. Pepe, and A. Ferreira da Silva, Appl. Surf. Sci. 252, 5361 (2006).
7. T. Serin, N. Serin, S. Karadeniz, H. Sarl, N. Tugluoglu, and O. Pakma, J. Non-Cryst. Solids 352, 209 (2006).
8. Z. Songqing, Z. Yueliang, W. Shufang, W. Kun, and H. Peng, Rare Metals 25, 693 (2006).
9. S. Rozati, Mater. Charact. 57, 150 (2006).
10. S. Tamura, T. Ishida, H. Magara, T. Mihara, O. Tabata, and T. Tatsuta, Thin Solid Films 343-344, 142 (1999).
11. T. Racheva and G. Critchlow, Thin Solid Films 292, 299 (1997).
12. H. Ohsaki, Thin Solid Films 281-282, 223 (1996).
13. T. Yamazaki, U. Mizutani, and Y. Iwama, Jpn. J. Appl. Phys. 22, 454 (1983).
14. A. De and S. Ray, J. Phys. D: Appl. Phys. 24, 719 (1991).
15. D. Jousse, C. Constantino, and I. Chambouleyron, J. Appl. Phys. 54, 430 (1983).
16. S. Muranaka, Y. Bando, and T. Takada, Thin Solid Films 86, 11 (1981).
17. K. Sundaram and G. Bhagavat, J. Phys. D: Appl. Phys. 14, 333 (1981).
18. G. V. Samsonov, The Oxide Handbook, 2nd ed., IFI/PLENUM, New York (1982).
19. S. Hamzaoui and M. Adnane, Applied Energy 65, 19 (2000).
20. M. Gubbins, V. Casey, and S. Newcomb, Thin Solid Films 405, 270 (2002).
21. A. Espinosa, N. Menendez, C. Prieto, and A. de Andres, J. Non-Cryst. Solids 354, 5269 (2008).
22. B. Mukashev, S. Tokmoldin, N. Beisenkhanov, S. Kikkarin, I. Valitova, V. Glazman, A. Aimagambetov, E. Dmitrieva, and B. Veremenithev, Mater. Sci. Eng. B 118, 164 (2005).
23. R. Howson, H. Barankova, and A. Spencer, Thin Solid Films 196, 315 (1991).
24. J. Ko, I. Kim, D. Kim, K. Lee, T. Lee, J.-H. Jeong, B. Cheong, Y. Baik, and W. Kim, Thin Solid Films 494, 42 (2006).
25. W. Choi, J. Cho, S. Song, H. Jung, S. Koh, K. Yoon, C. Lee, M. Sung, and K. Jeong, Thin Solid Films 304, 85 (1997).