Effect of sample bias on backscattered ion spectroscopy in the helium ion microscope

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 6, 2010, Pages 1377-1380

  Behan, G ^a   Feng, J F ^a   Zhang, H Z ^a   Nirmalraj, P N ^a   Boland, J J ^a  

^a TRINITY COLLEGE DUBLIN   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED BIAS VOLTAGE; BACK-SCATTERED; CHARACTERISTIC PEAKS; HELIUM ION; ION SPECTRUM; SAMPLE BIAS; THIN LAYERS;

BIAS VOLTAGE; HAFNIUM OXIDES; HELIUM; ION MICROSCOPES; RUTHENIUM; THIN FILMS;

IONS;

EID: 78149448845     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3502667     Document Type: Article

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