Development of {110}<001> annealing texture in al-free and 0.1 %Mn-added 3 %Si-Fe alloy strips containing 95 ppm sulfur

Metals and Materials International

Volumn 16, Issue 2, 2010, Pages 305-310

  Heo, N H ^a   Yoon, G G ^a  

^a Korea Electric Power Research Institute (KEPRI)   (South Korea)

Author keywords

Annealing; Electrical electronic materials; Grain growth; X ray diffraction

Indexed keywords

ANNEALING; CRYSTALLOGRAPHY; GRAIN BOUNDARIES; GRAIN GROWTH; IRON ALLOYS; SEGREGATION (METALLOGRAPHY); TEXTURES; X RAY DIFFRACTION;

ALLOY STRIP; ANNEALING ATMOSPHERES; ANNEALING TEXTURES; ELECTRICAL/ELECTRONIC MATERIALS; GRAIN-BOUNDARY CONCENTRATION; PREANNEALING; SEGREGATION KINETICS; SELECTIVE GROWTH;

SILICON ALLOYS;

EID: 78149442117     PISSN: 15989623     EISSN: 20054149     Source Type: Journal    
DOI: 10.1007/s12540-010-0422-z     Document Type: Article

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