Ultrapurification of hydrogen peroxide solution from ionic metals impurities to semiconductor grade by reverse osmosis

Separation and Purification Technology

Volumn 76, Issue 1, 2010, Pages 44-51

  Abejon R ^a   Garea, A ^a   Irabien, A ^a  

^a UNIVERSITY OF CANTABRIA   (Spain)

Author keywords

High purity chemicals; Hydrogen peroxide; Metallic ion traces; Reverse osmosis; Ultrapurification

Indexed keywords

ELECTRONIC GRADE; EXPERIMENTAL STUDIES; FLAT-SHEET MEMBRANE; HIGH-PURITY CHEMICALS; IMPURITIES IN; KEDEM-KATCHALSKY MODEL; LABORATORY SCALE; METAL REJECTION; METALLIC IMPURITY; METALLIC ION TRACES; PERMEATE FLUX; QUALITY REQUIREMENTS; SEMICONDUCTOR EQUIPMENT AND MATERIALS INTERNATIONALS; ULTRA-PURIFICATION;

CHEMICALS; HYDROGEN; HYDROGEN PEROXIDE; IMPURITIES; OXIDATION; REVERSE OSMOSIS;

OSMOSIS MEMBRANES;

EID: 78149282219     PISSN: 13835866     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.seppur.2010.09.018     Document Type: Article

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