Interaction of O2, H2 O, N2, and O 3 with stoichiometric and reduced ZnO (10 1̄0) surface

Physical Review B - Condensed Matter and Materials Physics

Volumn 82, Issue 15, 2010, Pages

  Xu, H ^a   Zhang, R Q ^a   Tong, S Y ^b,c  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b UNIVERSITY OF HONG KONG   (Hong Kong)

^c UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 78149237997     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.82.155326     Document Type: Article

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