Solution-processed photodetectors from colloidal silicon nano/micro particle composite

Optics Express

Volumn 18, Issue 21, 2010, Pages 21622-21627

  Tu, Chang Ching ^a,b   Tang, Liang ^b   Huang, Jiangdong ^b   Voutsas, Apostolos ^b   Lin, Lih Y ^a  

^a University of Washington   (United States)

^b SHARP LABORATORIES OF AMERICA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHELATION; ETCHING; HYDROSILYLATION; OPTOELECTRONIC DEVICES; PASSIVATION; PHOTODETECTORS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; SURFACE REACTIONS;

ALKYL LIGANDS; COLLOIDAL SUSPENSIONS; ENHANCED SCATTERING; ETCHING PROCESS; EXTINCTION SPECTRA; FREE SI; HYDROSILYLATION REACTION; MICRO-SIZE PARTICLES; PARTICLE COMPOSITES; POROUS SURFACE; SI WAFER; SI-PARTICLE; SOLUTION-PROCESSED; SURFACE PASSIVATION; THIN FILM PHOTODETECTORS; ULTRA VIOLET EXCITATION; ULTRA-SONICATION;

SUSPENSIONS (FLUIDS);

LIGAND; METAL NANOPARTICLE; NANOCOMPOSITE; NANOPARTICLE; SILICON;

ARTICLE; CHEMISTRY; COLLOID; ELECTROCHEMISTRY; LIGHT; METHODOLOGY; OPTICS; POROSITY; QUANTUM THEORY; RADIATION SCATTERING; SEMICONDUCTOR; SURFACE PROPERTY;

COLLOIDS; ELECTROCHEMISTRY; LIGANDS; LIGHT; METAL NANOPARTICLES; NANOCOMPOSITES; NANOPARTICLES; OPTICS AND PHOTONICS; POROSITY; QUANTUM THEORY; SCATTERING, RADIATION; SEMICONDUCTORS; SILICON; SURFACE PROPERTIES;

EID: 78049522548     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.021622     Document Type: Article

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