Design and fabrication of poly(dimethylsiloxane) arrayed waveguide grating

Optics Express

Volumn 18, Issue 21, 2010, Pages 21732-21742

  Kee, Jack Sheng ^a,b   Poenar, Daniel Puiu ^b   Neužil, Pavel ^a   Yobaş, Levent ^a,c   Chen, Yu ^a  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

MICROCHANNELS; OPTICAL WAVEGUIDES; WAVEGUIDES;

AWG-DEVICES; CHANNEL SPACINGS; FOUR-CHANNEL; POLYDIMETHYLSILOXANE PDMS; RIB WAVEGUIDES; SINGLE MODE; SPECTROSCOPY APPLICATIONS; TRANSMISSION SPECTRUMS; VISIBLE LIGHT; VISIBLE-LIGHT WAVELENGTHS;

ARRAYED WAVEGUIDE GRATINGS;

BAYSILON; DIMETICONE; POLYMER;

ALGORITHM; ARTICLE; CHEMISTRY; COMPUTER SIMULATION; LIGHT; MICROCHIP ANALYSIS; MICROFLUIDIC ANALYSIS; MICROFLUIDICS; OPTICS; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; THEORETICAL MODEL;

ALGORITHMS; COMPUTER SIMULATION; DIMETHYLPOLYSILOXANES; LIGHT; MICROCHIP ANALYTICAL PROCEDURES; MICROFLUIDIC ANALYTICAL TECHNIQUES; MICROFLUIDICS; MICROSCOPY, ELECTRON, SCANNING; MODELS, THEORETICAL; OPTICS AND PHOTONICS; POLYMERS; TEMPERATURE;

EID: 78049492557     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.021732     Document Type: Article

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