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Volumn 182, Issue 1-2, 2010, Pages 81-83

Effect of monochromator X-ray Bragg reflection on photoelectric cross section

Author keywords

Angular dependence; ARXPS; Bragg reflection; Photoelectric cross section; Polarization; XPS

Indexed keywords

ANGULAR DEPENDENCE; ARXPS; BRAGG REFLECTION; PHOTOELECTRIC CROSS-SECTIONS; XPS;

EID: 78049478522     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2010.07.009     Document Type: Article
Times cited : (36)

References (12)
  • 6
    • 12844288009 scopus 로고    scopus 로고
    • National Institute of Standards and Technology Version 1.0
    • C.J. Powell, A. Jablonski, National Institute of Standards and Technology, Standard Reference Database 82, Version 1.0, 2001.
    • (2001) Standard Reference Database , vol.82
    • Powell, C.J.1    Jablonski, A.2
  • 12
    • 78049456719 scopus 로고    scopus 로고
    • Characterization of the Theta Probe ARXPS tool at AMAT and applications to the characterization of hafnia/silica/Si nanofilms
    • A. Herrera-Gomez, G. Conti, Y. Uritsky, Characterization of the Theta Probe ARXPS tool at AMAT and applications to the characterization of hafnia/silica/Si nanofilms, Technical Report, 2009.
    • (2009) Technical Report
    • Herrera-Gomez, A.1    Conti, G.2    Uritsky, Y.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.