Modification of sputter deposited solid-state electrolyte thin films

Vacuum

Volumn 84, Issue 11, 2010, Pages 1296-1301

  Chiu, K F ^a   Chen, C C ^a   Lin, K M ^a   Lin, H C ^b   Lo, C C ^a   Ho, W H ^c   Jiang, C S ^c  

^a FENG CHIA UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c TAIWAN TEXTILE RESEARCH INSTITUTE   (Taiwan)

Author keywords

Adatom mobility; Solid state electrolyte; Sputtering

Indexed keywords

ADATOM MOBILITIES; ALL-SOLID-STATE; CYCLING STABILITY; ELECTROLYTE THIN FILM; LIPON ELECTROLYTES; LOW PRESSURES; LOW TEMPERATURES; OXYNITRIDES; POST ANNEALING; RF-MAGNETRON SPUTTERING; SMOOTH INTERFACE; SMOOTH SURFACE; SOLID-STATE ELECTROLYTE; THIN FILM BATTERY; WORKING PRESSURES;

ADATOMS; ANNEALING; CRYSTALLINE MATERIALS; LITHIUM; MAGNETRON SPUTTERING; NITRIDES; OPEN CIRCUIT VOLTAGE; PHOSPHORUS; SOLID ELECTROLYTES; THIN FILMS; VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 78049444591     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.02.006     Document Type: Article

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