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Applied Physics A: Materials Science and Processing

Volumn 101, Issue 3, 2010, Pages 573-577

Thermal conductivity of PVD TiAlN films using pulsed photothermal reflectance technique

(3) Ding, Xing Zhao a Samani, M K a Chen, George b

a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY (Singapore)

b NONE

Author keywords

[No Author keywords available]

Indexed keywords

304 STAINLESS STEEL; ATOMIC RATIO; GOLD LAYER; PULSED PHOTOTHERMAL REFLECTANCE; PURE TIN; ROOM TEMPERATURE; ROTATING CATHODE; TIALN COATINGS; TIALN FILM;

ATOMS; COATINGS; CUTTING TOOLS; FILM THICKNESS; GOLD COATINGS; REFLECTION; SEMICONDUCTING GALLIUM COMPOUNDS; STAINLESS STEEL; THERMAL CONDUCTIVITY; THERMOANALYSIS; TITANIUM NITRIDE;

THERMAL CONDUCTIVITY OF SOLIDS;

EID: 78049338457 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-010-5900-0 Document Type: Article

Times cited : (26)

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