Tailoring spectral position and width of field enhancement by focused ion-beam patterning of plasmonic nanoparticles

Physica Status Solidi - Rapid Research Letters

Volumn 4, Issue 10, 2010, Pages 262-264

  Rosa, Lorenzo ^a   Sun, Kai ^b   Szymanska, Joanna ^c   Hudson, Fay E ^c   Dzurak, Andrew ^c   Linden, Andre ^d   Bauerdick, Sven ^e   Peto, Lloyd ^e   Juodkazis, Saulius ^a  

^a SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

^b HOKKAIDO UNIVERSITY   (Japan)

^c UNIVERSITY OF NEW SOUTH WALES   (Australia)

^d Raith Asia Ltd   (Hong Kong)

^e Raith GmbH   (Germany)

Author keywords

Electron beam lithography; Ion beam lithography; Light field enhancement; Nanoparticles; Patterning; Plasmonics

Indexed keywords

AU-NANOPARTICLES; CUT-THROUGH; FIELD ENHANCEMENT; LIGHT FIELD ENHANCEMENT; LIGHT FIELDS; METAL DEPOSITION; NANO-GAP; PATTERNING; PLASMONIC; PLASMONIC NANOPARTICLE; PLASMONICS; SCANNING ELECTRON MICROSCOPY IMAGE; SPECTRAL POSITION; THREE-DIMENSIONAL (3D);

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; ION BEAMS; IONS; NANOPARTICLES; OPTICAL PROPERTIES; PLASMONS; SCANNING ELECTRON MICROSCOPY; THREE DIMENSIONAL;

GOLD;

EID: 77958585121     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.201004239     Document Type: Article

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