Electrochemical stripping analysis of cadmium on tantalum electrode

Electrochemistry Communications

Volumn 12, Issue 10, 2010, Pages 1291-1293

  Zhang, Wei ^a   Liu, Zhongyuan ^a   Zhu, Shuyun ^a,b   Chen, Jiuan ^a,b   Xu, Guobao ^a  

^a CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Cadmium; Stripping analysis; Tantalum

Indexed keywords

CADMIUM ANALYSIS; DEPOSITION POTENTIAL; DEPOSITION TIME; DETECTION LIMITS; DIFFERENTIAL PULSE ANODIC STRIPPING VOLTAMMETRY; ELECTROCHEMICAL STRIPPING ANALYSIS; EXCELLENT PERFORMANCE; LINEAR BEHAVIOR; OPERATIONAL PARAMETERS; OPTIMIZED CONDITIONS; REAL SAMPLES; RELATIVE STANDARD DEVIATIONS; REPRODUCIBILITIES; STRIPPING ANALYSIS; TANTALUM ELECTRODE;

CADMIUM; ELECTRIC IMPEDANCE; ELECTROMAGNETIC INDUCTION; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; OPTIMIZATION; TANTALUM; TRACE ANALYSIS;

ELECTROCHEMICAL ELECTRODES;

EID: 77958051436     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2010.07.002     Document Type: Article

References (36)

1. J. Wang Stripping Analysis 1985 Vch Publishers Deerfiled Beach, Florida
2. S. Jones, and R.G. Compton Curr. Anal. Chem. 4 2008 170
3. S.B. Hočevar, B. Ogorevc, J. Wang, and B. Pihlar Electroanalysis 14 2002 1707
4. E. Espada-Bellido, M.D. Galindo-Riaño, and M. García-Vargas J. Hazard. Mater. 166 2009 1326
5. J. Wang, J.M. Lu, S.B. Hočevar, and P.A.M. Farias Anal. Chem. 72 2000 3218
6. S.B. Hočevar, I. Švancara, B. Ogorevc, and K. Vytřas Anal. Chem. 79 2007 8639
7. A. Economou, and P.R. Fielden Analyst 128 2003 205
8. Ø. Mikkelsen, and K.H. Schrøder Electroanalysis 15 2003 679
9. M.L. Tercier, J. Buffle, and F. Graziottin Electroanalysis 10 1998 355
10. K. Vytřas, I. Švancara, and R. Metelka Electroanalysis 14 2002 1359
11. S. Legeai, and O. Vittori Anal. Chim. Acta 560 2006 184
12. P. González, V.A. Cortínez, and C.A. Fontán Talanta 58 2002 679
13. N.Y. Stozhko, N.A. Malakhova, M.V. Fyodorov, and K.Z. Brainina J. Solid State Electrochem. 12 2008 1185
14. N.Y. Stozhko, N.A. Malakhova, M.V. Fyodorov, and K.Z. Brainina J. Solid State Electrochem. 12 2008 1219
15. J. Wang, and B.M. Tian Anal. Chem. 65 1993 1529
16. Ø. Mikkelsen, and K.H. Schrøder Electroanalysis 13 2001 687
17. Y. Bonfil, and E. Kirowa-Eisner Anal. Chim. Acta 457 2002 285
18. M.A. Nolan, and S.P. Kounaves Anal. Chem. 71 1999 3567
19. C. Prior, and G.S. Walker Electroanalysis 18 2006 823
20. J. Wang Electroanalysis 17 2005 1341
21. R.T. Kachoosangi, C.E. Banks, X.B. Ji, and R.G. Compton Anal. Sci. 23 2007 283
22. A. Economou TrAC Trends Anal. Chem. 24 2005 334
23. R. Pauliukaite, and C.M.A. Brett Electroanalysis 17 2005 1354
24. C. Gouveia-Caridade, R. Pauliukaite, and C.M.A. Brett Electroanalysis 18 2006 854
25. C.E. Banks, J. Kruusma, M.E. Hyde, A. Salimi, and R.G. Compton Anal. Bioanal. Chem. 379 2004 277
26. G. Kefala, and A. Economou Anal. Chim. Acta 576 2006 283
27. C. Kokkinos, A. Economou, I. Raptis, C.E. Efstathiou, and T. Speliotis Electrochem. Commun. 9 2007 2795
28. Y.C. Tsai, B.A. Coles, K. Holt, J.S. Foord, F. Marken, and R.G. Compton Electroanalysis 13 2001 831
29. K.E. Toghill, G.G. Wildgoose, A. Moshar, C. Mulcahy, and R.G. Compton Electroanalysis 20 2008 1731
30. J. Kruusma, C.E. Banks, and R.G. Compton Anal. Bioanal. Chem. 379 2004 700
31. A. Manivannan, R. Kawasaki, D.A. Tryk, and A. Fujishima Electrochim. Acta 49 2004 3313
32. V. Martinez, C. Besset, F. Monsieur, L. Montès, and G. Ghibaudo Microelectron. Eng. 84 2007 2310
33. F. Gaillard, Y.E. Sung, and A.J. Bard J. Phys. Chem. B 103 1999 667
34. V. Kašuba, R. Rozgaj, M.M. Sarić, and M. Blanuša J. Appl. Toxicol. 22 2002 271
35. R. Pauliukaite, S.B. Hočevar, B. Ogorevc, and J. Wang Electroanalysis 16 2004 719
36. G. Kefala, A. Economou, A. Voulgaropoulos, and M. Sofoniou Talanta 61 2003 603