Excitation energy transfer of metastable krypton atoms in Kr-He-Xe low pressure glow discharge for mercury-free lighting

Japanese Journal of Applied Physics

Volumn 49, Issue 8 PART 1, 2010, Pages

  Hwang, Hyeon Seok ^a   Baik, Hong Koo ^a   Park, Ki Wan ^b   Song, Kie Moon ^c   Lee, Se Jong ^d  

^a Yonsei University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

^c Konkuk University   (South Korea)

^d Kyungsung University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE CHARACTERISTICS; EMISSION PROPERTIES; HIGHER EFFICIENCY; KRYPTON ATOMS; LOW PRESSURE GLOW DISCHARGES; MERCURY-FREE; OPTIMUM CONDITIONS; POSITIVE COLUMN; VACUUM ULTRAVIOLETS;

ENERGY TRANSFER; GAS MIXTURES; GLOW DISCHARGES; INFRARED RADIATION; KRYPTON; LIGHTING; MERCURY (METAL); RADIOMETERS;

XENON;

EID: 77957857676     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.080218     Document Type: Article

References (18)

1. M. Born: J. Phys. D 34 (2001) 909.
2. M. Jinno, M. Okamoto, M. Takeda, and H. Motomura: J. Phys. D 40 (2007) 3889.
3. M. Czichy, T. Hartmann, J. Mentel, and P. Awakowicz: J. Phys. D 41 (2008) 144027.
4. M. Wendt, S. Peters, D. Loffhagen, A. Kloss, and M. Kettlitz: J. Phys. D 42 (2009) 185208.
5. M. Jinno, H. Kurokawa, and M. Aono: Jpn. J. Appl. Phys. 38 (1999) 4608.
6. M. Jinno, H. kurokawa, and M. Aono: Jpn. J. Appl. Phys. 38 (1999) 4613.
7. D. Uhrlandt, R. Bussiahn, S. Gorchakov, H. Lange, D. Loffhagen, and D. Notzold: J. Phys. D 38 (2005) 3318.
8. S. Gortchakov and D. Uhrlandt: Plasma Sources Sci. Technol. 14 (2005) 177.
9. T. J. Sommerer and D. A. Doughty: J. Phys. D 31 (1998) 2803.
10. R. Bussiahn, S. Gortchakov, H. Lange, and D. Uhrlandt: J. Appl. Phys. 95 (2004) 4627.
11. S. Gortchakov, H. Lange, and D. Uhrlandt: J. Appl. Phys. 93 (2003) 9508.
12. T. Bezanahary, G. Zissis, and S. A. S. Salo: IEEE Trans. Plasma Sci. 31 (2003) 587.
13. H. Sarrokh, E. Robert, Ch. Cachoncinlle, R. Viadrosa, and J. M. Pruvesle: Proc. 9th Int. Symp. Science and Technology of Light Sources, 2001, p. 353.
14. E. Nasser: Fundamentals of Gaseous Ionization and Plasma Electronics (Wiley, New York, 1971) p. 61.
15. K. W. Park, H. S. Hwang, M. H. Han, and H. K. Baik: Appl. Phys. Lett. 92 (2008) 061502.
16. E. H. Choi, J. C. Ahn, M. W. Moon, Y. Jung, M. C. Choi, Y. H. Seo, G. Cho, H. S. Uhm, K. Tachibana, K. W. Whang, and M. Kristansen: Appl. Phys. Lett. 81 (2002) 3341.
17. J. C. Ahn, T. Y. Kim, J. J. Ko, G. S. Cho, and E. H. Choi: J. Appl. Phys. 87 (2000) 8045.
18. T. Shiga, L. C. Pitchford, J. P. Boeuf, and S. Mikoshiba: J. Phys. D 36 (2003) 512.