Radiation properties of low-pressure discharges in rare-gas mixtures containing xenon

Plasma Sources Science and Technology

Volumn 14, Issue 1, 2005, Pages 177-183

  Gortchakov, S ^a   Uhrlandt, D ^a  

^a Inst F Niedertemperatur P   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE LAMPS; IONIZATION; MATHEMATICAL MODELS; PLASMA COLLISION PROCESSES; PLASMA DISPLAY DEVICES; REACTION KINETICS; ULTRAVIOLET RADIATION; XENON;

BUFFER GASES; RADIAL STRUCTURE; RADIATION EFFICIENCY; XENON RESONANCE REACTIONS;

PLASMAS;

EID: 14644445127     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/14/1/019     Document Type: Article

References (35)

1. Kurihara M and Makabe T 2001 J. Appl. Phys. 89 7756-63
2. Shiga T, Mikoshiba S and Shinada S 2001 Electron. Commun. Japan II 84 55-63
3. Oda A, Sakai Y, Akashi H and Sugawara H 1999 J. Phys. D: Appl. Phys. 32 2726-36
4. Veerasingam R, Campbell R and McGrath R 1996 IEEE Trans. Plasma Sci. 24 1399
5. Meunier J, Belenguer P and Boeuf J 1995 J. Appl. Phys. 78 731-45
6. Takahashi K, Hashiguchi S, Murakami Y, Takei M, Itoh K, Tachibana K and Sakai T 1996 Japan. J. Appl. Phys. 35 251-8
7. Tamida T, Sanders S and Tanaka M 2000 Japan. J. Appl. Phys. 39 583-9
8. Sommerer T 1996 J. Phys. D: Appl. Phys. 29 769-78
9. Sommerer T and Doughty D 1998 J. Phys. D: Appl. Phys. 31 2803-17
10. Lange H, Leipold F, Otte M, Pfau S and Uhrlandt D 1999 Plasma Chem. Plasma Process. 19 255-84
11. Sarrokh H, Robert E, Cachoncinlle Ch, Viladrosa R and Pouvesle J M 2001 Proc. 15th ISPC vol 1, pp 561-6
12. Sommerer T and Doughty D 2004 European Patent EP 0 793 258 B1
13. Capdeville H, Pédoussat C and Pitchford L 2002 J. Appl. Phys. 91 1026-30
14. Gortchakov S, Lange H and Uhrlandt D 2003 J. Appl. Phys. 93 9508-15
15. Bussiahn R, Gortchakov S, Lange H and Uhrlandt D 2004 J. Appl. Phys. 95 4627-34
16. Uhrlandt D and Franke S 2002 J. Phys. D: Appl. Phys. 35 680-8
17. Uhrlandt D and Winkler R 1996 Plasma Chem. Plasma Process. 16 517-45
18. Uhrlandt D, Schmidt M, Behnke J F and Bindemann T 2000 J. Phys. D: Appl. Phys. 33 2475-82
19. Nakazaki S, Berrington K, Eissner W and Itikawa Y 1997 J. Phys. B: At. Mol. Opt. Phys. 30 5805-18
20. Vriens L and Smeets AHM 1980 Phys. Rev. A 22 940-51
21. Deutsch H, Becker K, Matt S and Mark T 1999 J. Phys. B: At. Mol. Opt. Phys. 32 4249-59
22. O'Malley T F and Crompton R W 1980 J. Phys. B: At. Mol. Phys. 13 3451-64
23. Zeman V and Bartschat K 1997 J. Phys. B: At. Mol. Opt. Phys. 30 4609-22
24. Wetzel R C, Baiocchi F A, Hayes T R and Freund S 1987 Phys. Rev. A 35 559
25. Alford W 1992 J. Chem. Phys. 96 4330-40
26. Hickman A P, Huestis D and Saxon R P 1993 J. Chem. Phys. 98 5419-30
27. Yamabe C, Buckman S and Phelps A 1983 Phys. Rev. A 27 1345-52
28. Schaper M and Scheibner H 1969 Contrib. Plasma Phys. 9 43-57
29. Rapp D and Englander-Golden P 1965 J. Chem. Phys. 43 1464-79
30. Igarashi K, Mikoshiba S, Watanabe Y, Suzuki M and Murayama S 1995 J. Phys. D: Appl. Phys. 28 1377-83
31. Golubovskii Y B, Lange H, Porokhova I A and Uhrlandt D 2001 J. Phys. D: Appl. Phys. 34 1840-8
32. Uhrlandt D 2002 J. Phys. D: Appl. Phys. 35 2159-68
33. Kortshagen U, Busch C and Tsendin L D 1996 Plasma Sources Sci. Technol. 51-17
34. Uchida S, Sugawara H, Sakai Y, Watanabe T and Hong B H 2001 J. Phys. D: Appl. Phys. 34 947-53
35. Min B and Lee S H 2000 J. Vac. Sci. Technol. A 18 349-55