Carbon film deposition and flaking studies in ion thruster environments

41st AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit

Volumn , Issue , 2005, Pages

  Hanna, J ^a,b   Doerner, R P ^a,b   Tynan, G R ^a,c   Yu, J H ^a,b   Oyarzabal, E ^a,c   Taylor, K J ^a,c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Center for Energy Research   (United States)

^c Department of Mechanical and Aerospace Engineering ^*

Author keywords

[No Author keywords available]

Indexed keywords

CARBON ATOMS; CARBON DEPOSITION; CARBON FLAKES; CARBON LAYERS; CHAMBER WALLS; DEPOSITION TIME; FILM DEPOSITION; FILM QUALITY; HIGH VOLTAGE; ION OPTICS; ION THRUSTER; SPUTTERED MATERIALS; STAINLESS STEEL SUBSTRATES; SUBSTRATE SURFACE; VACUUM CHAMBERS;

ATMOSPHERIC PRESSURE; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; ION PROPULSION; IONS; OXIDE MINERALS; PROPULSION; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; STAINLESS STEEL; THICK FILMS; VACUUM; VACUUM DEPOSITION;

SUBSTRATES;

EID: 77957840860     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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