Optical properties of silicon nanowires array fabricated by metal-assisted electroless etching

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7772, Issue , 2010, Pages

  Guo, Zhongyi ^a   Jung, Jin Young ^a   Zhou, Keya ^a   Xiao, Yanjun ^a   Jee, Sang Won ^a   Moiz, S A ^a   Lee, Jung Ho ^a  

^a Hanyang University   (South Korea)

Author keywords

Absorption; Dielectric function; Reflection; Silicon nanowire

Indexed keywords

ABSORPTION THEORY; COMPLEX DIELECTRIC CONSTANT; DIELECTRIC FUNCTIONS; EFFECTIVE REFRACTIVE INDEX; ELECTROLESS ETCHINGS; IMAGINARY PARTS; OPTICAL PARAMETER; ORDERS OF MAGNITUDE; PEAK POSITION; SI WAFER; SILICON NANOWIRE; SILICON NANOWIRES;

ABSORPTION; ENERGY CONVERSION; ETCHING; KRAMERS-KRONIG RELATIONS; LIGHT REFRACTION; NANOWIRES; REFRACTIVE INDEX; REFRACTOMETERS; SILICON; SILICON WAFERS; SOLAR ENERGY; SOLAR RADIATION;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77957829884     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.860397     Document Type: Conference Paper

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