Fabrication of carbon nanoneedle and carbon nanowall mixture film with two-step growth method

Materials Letters

Volumn 65, Issue 1, 2011, Pages 78-81

  Wang, Hong Xing ^a   Jiang, Nan ^b   Zhang, Hui ^c   Hiraki, Akio ^b   Bu, Ren An ^c  

^a Seki Technotron Corp   (Japan)

^b KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

^c XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

CVD; Field emission; Nano carbon film; Nucleation

Indexed keywords

A-CARBON; ARRAY DENSITIES; AS-GROWN; CARBON NANOWALLS; CVD; DIRECT CURRENT PLASMAS; ELECTRON EMITTERS; EMISSION CURRENT DENSITY; EMITTER ARRAYS; FIELD EMISSION CURRENTS; FIELD EMISSION DEVICES; HIGH DENSITY; IV CHARACTERISTICS; MIXTURE FILMS; NANO-CARBON; STAINLESS STEEL SUBSTRATES; TWO-STEP GROWTH; TWO-TEMPERATURE;

CARBON FILMS; CHEMICAL VAPOR DEPOSITION; FIELD EMISSION; NANONEEDLES; NUCLEATION; PLASMA DEPOSITION; STAINLESS STEEL;

FILM GROWTH;

EID: 77957746908     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2010.09.021     Document Type: Article

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