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Volumn 5, Issue 2, 2009, Pages 91-94
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High performance polycrystalline thin-film transistors formed by copper metal induced unidirectional crystallization
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Author keywords
Copper; Metal induced lateral crystallization (MILC); Nickel; Thin film transistors
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Indexed keywords
AMORPHOUS SILICON THIN FILMS;
COPPER METAL;
CRYSTALLIZATION RATES;
DEVICE PERFORMANCE;
GLASS SUBSTRATES;
METAL-INDUCED LATERAL CRYSTALLIZATION;
METAL-INDUCED LATERAL CRYSTALLIZATION (MILC);
POLYCRYSTALLINE;
POLYCRYSTALLINE SILICON THIN-FILM TRANSISTOR;
PRACTICAL USE;
AMORPHOUS FILMS;
AMORPHOUS SILICON;
COPPER;
CRYSTALLIZATION;
METALS;
NICKEL;
POLYCRYSTALLINE MATERIALS;
POLYSILICON;
SEMICONDUCTING SILICON COMPOUNDS;
SUBSTRATES;
THIN FILM TRANSISTORS;
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EID: 77957690718
PISSN: 17388090
EISSN: None
Source Type: Journal
DOI: 10.3365/eml.2009.06.091 Document Type: Article |
Times cited : (4)
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References (7)
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