Oxygen reduction reaction activity and electrochemical stability of thin-film bilayer systems of platinum on niobium oxide

Journal of Physical Chemistry C

Volumn 114, Issue 39, 2010, Pages 16463-16474

  Zhang, Li ^a,b   Wang, Liya ^b,c   Holt, Chris M B ^a,b   Navessin, Titichai ^b   Malek, Kourosh ^b   Eikerling, Michael H ^b,c   Mitlin, David ^a,b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^c SIMON FRASER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BAND MODEL; BASELINE SYSTEMS; BI-LAYER; BILAYER SYSTEMS; DFT CALCULATION; ELECTROCHEMICAL ACTIVITIES; ELECTROCHEMICAL STABILITIES; ELECTROCHEMICAL TESTING; ELECTRONIC CHARGE DENSITY; GLASSY CARBON ELECTRODES; MASS ACTIVITY; OXYGEN INCORPORATION; OXYGEN REDUCTION REACTION; POSITIVE EFFECTS; POTENTIAL CYCLING; THEORETICAL CALCULATIONS;

CYCLIC VOLTAMMETRY; DENSITY FUNCTIONAL THEORY; ELECTROCATALYSTS; ELECTROLYTIC REDUCTION; ELECTRONIC STRUCTURE; GLASSY CARBON; NIOBIUM; OXYGEN; PLATINUM; SULFUR COMPOUNDS;

NIOBIUM OXIDE;

EID: 77957591852     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp104306j     Document Type: Article

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